Verteq ST600-C1-MC2-PVDF RF Wash Basin

Product Description

Verteq ST600-C1-MC2-PVDF Megasonic Wash Basin – Semiconductor Wet Processing Station

This used Verteq ST600-C1-MC2-PVDF is a specialized megasonic wash basin designed for semiconductor wafer cleaning and wet processing applications. The PVDF (polyvinylidene fluoride) construction provides exceptional chemical resistance against the aggressive acids, bases, and solvents used in semiconductor manufacturing.

Verteq (now part of Akrion Technologies and supported by SITEK Process Solutions) was a leading supplier of wet processing equipment for surface preparation applications, including wafer cleaning, rinsing, and drying systems .

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About Verteq Megasonic Technology

Megasonic cleaning uses high-frequency sound waves (typically 0.8-2 MHz) to enhance chemical cleaning processes on silicon wafers. Verteq’s Sunburst™ megasonic technology provides:

• Variable frequency control for optimized cleaning

• Precise power delivery to transducer arrays

• Chemical-resistant PVDF construction for wet environments

• Consistent, repeatable results for critical cleaning steps

A Verteq focused beam, chain drive bath operating at 922 kHz with 300W maximum input power (supplied to two flat transducers) has been documented in semiconductor research applications .

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Key Specifications

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Related Verteq Components

Verteq’s Sunburst™ megasonic systems typically include:

• Megasonic process controller (e.g., STQD600-C2-M2)

• Frequency generator with power supply

• Transducer array mounted in the PVDF bath

• Quick dump rinser with overflow weir

The ST600-C1-MC2-PVDF appears to be the basin component of such a system, featuring the chemically resistant PVDF construction essential for wet processing environments.

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Applications

• Semiconductor Wafer Cleaning: Megasonic-enhanced chemical cleaning

• Photoresist Removal: Stripping resist after lithography processes

• Particle Removal: Eliminating contaminants from wafer surfaces

• Post-CMP Cleaning: Cleaning after chemical-mechanical planarization

• Surface Preparation: Pre-deposition and pre-etch cleaning

• Research & Development: Semiconductor process development

SC-1/megasonic cleaning (ammonium hydroxide/hydrogen peroxide/water chemistry) has been documented as effective for sub-0.15 micron particle removal in semiconductor applications .

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Condition

SOLD AS IS
USED – SHOWS NORMAL WEAR from semiconductor fab environment
NO CONTROLLER, FREQUENCY GENERATOR, OR TRANSDUCERS INCLUDED (basin only unless specified)
PICTURE MAY NOT MATCH PRODUCT