Product Description
Verteq ST600-C1-MC2-PVDF Megasonic Frequency Generator with Keypad – For Semiconductor Wafer Cleaning Systems
This used Verteq ST600-C1-MC2-PVDF is a specialized megasonic frequency generator designed for semiconductor wafer cleaning and processing equipment. It includes the associated keypad for user control and programming.
Verteq (later part of CFM Technologies and then Mattson Technology) was a leading manufacturer of wet cleaning systems for the semiconductor industry. Their Sunburst™ megasonic technology was widely used for advanced photoresist removal and wafer cleaning applications .
The PVDF designation indicates construction with polyvinylidene fluoride, a chemically resistant fluoropolymer essential for withstanding the aggressive chemistries used in semiconductor wet processing.
About Verteq Megasonic Technology
Megasonic cleaning uses high-frequency sound waves (typically 0.8-2 MHz) to enhance chemical cleaning processes on silicon wafers. The Verteq Sunburst™ system provides:
-
Variable frequency control for optimized cleaning
-
Precise power delivery to transducer arrays
-
Chemical-resistant construction for wet environments
-
Consistent, repeatable results for critical cleaning steps
This technology was used in Quick Dump Rinsers (QDRs) and other wet process stations to remove particles, metals, and organic contaminants from wafer surfaces .
Key Specifications
| Specification | Details |
|---|---|
| Manufacturer | Verteq (now Mattson Technology) |
| Model | ST600-C1-MC2-PVDF |
| Type | Megasonic frequency generator |
| Part of Series | Sunburst™ Megasonic Controller family |
| Related Components | Similar to STQD600-C2-M2 used in Sunburst systems |
| Frequency | Variable megasonic range (typically 0.8-2 MHz) |
| Power | [Likely driven from system power supply] |
| Input Power Reference | 120 VAC, 50/60 Hz, 5A (for similar model) |
| Construction | PVDF components for chemical resistance |
| Interface | Front panel keypad for user control |
| Included | Frequency generator unit with attached/separate keypad |
| Application | Wafer cleaning, photoresist removal, particle removal |
| Industry | Semiconductor manufacturing |
Applications
-
Semiconductor Wafer Cleaning: Megasonic-enhanced chemical cleaning
-
Photoresist Removal: Stripping resist after lithography
-
Particle Removal: Eliminating contaminants from wafer surfaces
-
Post-CMP Cleaning: Cleaning after chemical-mechanical planarization
-
Surface Preparation: Pre-deposition and pre-etch cleaning
-
Quick Dump Rinsers: Integration with Verteq QDR systems
The Verteq Cobra VcS SA cleaning system, for example, uses a combination of ultra-dilute chemistries, advanced megasonics, and the VcS process for high-efficiency removal of particles, metals, and organics from wafer surfaces .
System Context
The ST600-C1-MC2-PVDF is part of Verteq’s Sunburst™ family of megasonic controllers. A related model, the STQD600-C2-M2, was used in the Sunburst Turbo Quick Dump Megasonic Process Controller . These generators work with transducer arrays to deliver megasonic energy to the cleaning bath.
Condition
SOLD AS IS
USED – SHOWS NORMAL WEAR (scuffs, minor marks)
POWER ON NOT TESTED – FUNCTIONALITY UNKNOWN
NO TRANSDUCER ARRAY, POWER SUPPLY, OR CABLES INCLUDED
PICTURE MAY NOT MATCH PRODUCT



