ARC12M Sputter Process Chamber – Plasma Sciences

Product Overview

The ARC12M Sputter Process Chamber by Plasma Sciences is an advanced deposition system engineered for high-quality thin-film applications. This chamber is integral to physical vapor deposition (PVD) processes, especially in producing thin films for semiconductors, optics, and advanced materials. Known for its precision and versatility, the ARC12M provides a highly controlled environment to achieve uniform thin-film coatings with minimal impurities.

Key Specifications

• Manufacturer: Plasma Sciences
• Model: ARC12M
• Chamber Type: Sputter Process Chamber
• Deposition Method: Physical Vapor Deposition (PVD)
• Process Capability: Multi-layer sputtering, co-sputtering, and reactive sputtering
• Substrate Size: Up to 300mm wafers
• Uniformity: Exceptional film uniformity, optimized for critical applications
• Pump Configuration: High-vacuum turbo-molecular pump with backing roughing pump
• Control System: User-friendly interface with advanced recipe control and monitoring
• Target Materials: Compatible with a wide range of metals and dielectrics
• Operating Pressure: Fine-tuned for low and high-pressure deposition settings
• Temperature Range: Customizable substrate heating capabilities for diverse material needs

Key Features

• High Precision: Delivers ultra-thin, uniform films with high repeatability, ideal for semiconductors and optical applications.
• Versatile Target Material: Accommodates various metals, alloys, and dielectric targets for research and industrial use.
• Advanced Automation: Integrated system control for recipe-based operations and real-time monitoring of deposition parameters.
• Efficient Pumping System: Turbo-molecular and roughing pump setup ensures a clean, high-vacuum environment.
• Robust Design: Built to withstand heavy-duty industrial applications with minimal downtime and maintenance.

Conclusion

The ARC12M Sputter Process Chamber is a top-tier solution for precision thin-film deposition. With its advanced capabilities and reliable performance, it serves as a valuable asset for R&D labs, semiconductor fabrication, and optical coating facilities. Invest in Plasma Sciences’ ARC12M to enhance your production and research outcomes.

Plasma Sciences ARC12M Sputter Process Chamber

(1) 8″ Target DIAMETER

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