Product Description
This listing includes three (3) available units, each with different configurations: see photos.
Karl Suss MJB3 Mask Aligner – Manual UV Exposure System for Photolithography and Microfabrication
This used Karl Suss MJB3 is a manual mask aligner designed for photolithography in semiconductor research, MEMS fabrication, and optoelectronics . As part of the Suss MJB series, it is a tabletop exposure system used to transfer patterns from a photomask to a photosensitive substrate (wafer, glass, or film) using UV light.
The MJB3 is a contact or proximity aligner, meaning it brings the mask into close contact or near-contact with the substrate before exposing it to UV radiation . It is a manual system, requiring the operator to load the mask and substrate, align them using the microscopes, and initiate the exposure cycle.
Key Specifications (Typical for MJB Series)
| Specification | Details |
|---|---|
| Manufacturer | Karl Suss (now SUSS MicroTec) |
| Model | MJB3 |
| Type | Manual Mask Aligner (Contact/Proximity) |
| UV Source | High-pressure mercury lamp (typical) |
| Exposure Mode | Soft, Hard, and Proximity contact |
| Substrate Size | Up to 3″ wafers / 25mm x 25mm (typical) |
| Alignment System | Binocular microscope with reticle |
| Stage | Manual X-Y-θ |
| Condition | Used – Untested |
Applications
-
Photolithography: Patterning photoresist on wafers for semiconductor and MEMS
-
Micro-optics: Pattern transfer for diffractive and refractive optics
-
LCD and Flat Panel Displays: Patterning for display manufacturing
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Research & Development: Process development in academic and industrial labs
