fused silica beamsplitter 632.8nm 514.5nm

Product Description

Precision Fused Silica Beamsplitter Plate – Dual-Band 632.8nm (Rmax) / 514.5nm (Tmax), Tw ≤ 0.050 Waves at 45° Incidence

This is a high-performance, custom-engineered dual-wavelength beamsplitter fabricated from UV-grade fused silica. Designed for precise beam management in multi-line laser systems, it features fully documented spectral performance, elite wavefront tolerance, and clear orientation markings—making it a rare and valuable surplus optic for advanced laser applications.

Key Specifications (As Marked):

• Diameter: ~75 mm

• Thickness: ~10 mm

• Material: UV-grade fused silica (low thermal expansion, high laser damage threshold)

• Spectral Performance at 45° AOI:

  • Rmax at 632.8 nm (HeNe alignment beam – highly reflected)

  • Tmax at 514.5 nm (Argon-ion green line – efficiently transmitted)

• Wavefront Error: Transmitted wavefront (Tw) ≤ 0.050 waves (exceptional optical precision)

• Coating: Dielectric beamsplitter coating; AR coating on one side (arrow-marked “AR”)

• Orientation: Edge marked “theta=45 degree” and arrow pointing to AR-coated side

Condition:

✅ EXCELLENT LAB SURPLUS – Pristine optical surfaces, no scratches or coating defects
✅ FULLY CHARACTERIZED – All performance parameters etched on edge

Why This Beamsplitter Is Exceptional:

• Dual-Wavelength Optimization: Precisely engineered to separate 632.8 nm (HeNe) and 514.5 nm (Argon) laser lines—critical for multi-line laser system design.

• Elite Wavefront Tolerance: Tw ≤ 0.050 waves ensures minimal distortion in transmitted beam, making it suitable for interferometry and precision alignment.

• Clear Orientation Guidance: Arrow marking eliminates guesswork; orient AR-coated side toward the source for optimal performance.

• Substantial Cost Savings: New custom equivalents from premium manufacturers exceed $800–$1,200.

Applications:

• Argon-Ion/HeNe Laser Systems: Separate the green 514.5 nm process beam from the red 632.8 nm alignment beam at 45° incidence.

• Precision Interferometry: Reference beamsplitter in Michelson or Mach-Zehnder setups requiring low wavefront error.

• Multi-Wavelength Beam Combining/Splitting: For advanced photonics research, spectroscopy, or laser printing/imaging systems.

• University & Industrial R&D: Ideal for labs developing or maintaining dual-wavelength laser architectures.

Installation Note:

For specified performance, mount at 45° angle of incidence (AOI) with the AR-coated side (arrow-marked) facing the incoming beam.