Product Description
Precision 3″ Diameter UV Laser Mirror – Optimized for 248 nm (KrF Excimer), Fused Silica Substrate
This used precision mirror measures 3 inches in diameter and features a specialized optical coating designed for high-performance UV applications. The key marking “Max R @ 248 nm” indicates it is optimized for maximum reflectance at the 248 nm wavelength, which is the primary emission line of the KrF excimer laser .
Excimer lasers operating at 248 nm are used in semiconductor lithography, LASIK eye surgery, materials processing, and advanced scientific research . Mirrors for these applications must withstand extremely high peak pulse energies and require specialized dielectric coatings on UV-grade substrates .
The additional marking “greater than 25% 497 nm” is a diagnostic indicator of the coating’s performance. This likely represents the measured reflectance at 497 nm, a common monitoring wavelength used during the manufacturing process to verify coating quality and consistency.
Technical Context: 248 nm Excimer Laser Mirrors
High-performance UV laser mirrors are critical components in excimer laser systems. Based on industry standards, this mirror likely features:
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Substrate Material: UV-grade fused silica, chosen for its high transmission in the UV and excellent thermal stability .
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Coating Type: A multi-layer dielectric coating engineered for high reflectance and high laser-induced damage threshold (LIDT) .
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Surface Quality: Typically 10-5 scratch-dig, essential for minimizing scatter and losses in high-energy UV applications .
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Surface Flatness: Typically λ/10 at 632.8 nm, ensuring minimal wavefront distortion .
While a standard 45° incidence 248 nm mirror from Newport offers >99% reflectivity , and others offer up to 97-99.5% , the specific reflectivity and angle of incidence (AOI) for this mirror are not provided by the marking and would need to be determined.
Applications
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Excimer Laser Systems: Beam steering and folding for KrF (248nm) lasers used in scientific, industrial, and medical applications.
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Semiconductor Processing: UV lithography and metrology systems .
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Medical Devices: Laser vision correction (LASIK) systems .
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Materials Processing: Micromachining and ablation of materials with UV light.
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Research: Laser spectroscopy, photochemistry, and other advanced laser experiments.
Condition
SOLD AS IS
USED – SHOWS NORMAL HANDLING (scuffs, minor marks)
CLEAR APERTURE: 3″ DIAMETER
MARKINGS: “MAX R @ 248 NM” AND “>25% 497 NM” PRESENT
NO SPECIFICATION SHEET INCLUDED
PICTURE MAY NOT MATCH PRODUCT
⚠ HANDLING NOTE: UV laser mirrors have sensitive coatings that can be easily damaged by improper handling or cleaning. Avoid touching the optical surface. If cleaning is necessary, use only approved optical cleaning methods suitable for UV coatings.




