Ion Equipment Corp 2.75″ Vacuum Ion Gun

Product Description

Ion Equipment Corporation 2.75″ Vacuum Ion Gun (AS IS)

This industrial ion source is designed for surface treatment, thin film deposition, and analytical applications in high vacuum environments, providing controlled ion beam generation for material science and semiconductor processing.

Key Specifications:

• Beam Diameter: 2.75 inch (nominal)

• Flange: Likely CF 2.75″ or similar

• Ion Source: Kaufman-type or similar (verify model)

• Voltage: High-voltage operation (1-2 kV typical)

• Gas Inlet: For argon or other process gases

• Focusing: Electrostatic lens elements

Condition:

⚠ SOLD AS AS-IS
⚠ UNTESTED – PULLED FROM VACUUM SYSTEM
⚠ NO POWER SUPPLY OR CONTROL CABLES
⚠ NO GAS LINES OR FILAMENTS INCLUDED
⚠ INTERNAL CONDITION UNVERIFIED

Applications:

• Surface cleaning and etching

• Thin film deposition assistance

• Surface analysis preparation (XPS, AES)

• Semiconductor device fabrication